CMP Orbis 柜式化学机械研磨抛光设备简介：
The
Orbis
CMP
system
is
a
precision engineered,
floor standing CMP
tool ideally suited for R&D environments where the main purpose or application is to conduct pilot production tests with optimum analytical capabilities and enhanced processing performance.
CMP Orbis 柜式化学机械研磨抛光设备特点：
l Multi use processing capability
l Low cost solution – high value results
l Advanced design configuration
l Flexible use of operation
l Consistent, reliable yields
l
Enhanced
ease
of
use
CMP Orbis
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